Beyond the Rayleigh scattering limit in high-Q silicon microdisks:: theory and experiment

被引:397
|
作者
Borselli, M [1 ]
Johnson, TJ [1 ]
Painter, O [1 ]
机构
[1] CALTECH, Dept Appl Phys, Pasadena, CA 91125 USA
来源
OPTICS EXPRESS | 2005年 / 13卷 / 05期
关键词
D O I
10.1364/OPEX.13.001515
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
Using a combination of resist reflow to form a highly circular etch mask pattern and a low-damage plasma dry etch, high-quality-factor silicon optical microdisk resonators are fabricated out of silicon-on-insulator (SOI) wafers. Quality factors as high as Q = 5 x 10(6) are measured in these microresonators, corresponding to a propagation loss coefficient as small as alpha similar to 0.1 dB/cm. The different optical loss mechanisms are identified through a study of the total optical loss, mode coupling, and thermally-induced optical bistability as a function of microdisk radius (5-30 mum). These measurements indicate that optical loss in these high-Q microresonators is limited not by surface roughness, but rather by surface state absorption and bulk free-carrier absorption. (C) 2005 Optical Society of America.
引用
收藏
页码:1515 / 1530
页数:16
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