Characterization of GaN-based HEMTs as Varactor Diode Devices

被引:0
|
作者
Hamdoun, Abdelaziz [1 ]
Roy, Langis [1 ]
Himdi, Mohammed [2 ]
Lafond, Olivier [2 ]
机构
[1] Carleton Univ, Dept Elect, Ottawa, ON K1S 5B6, Canada
[2] Univ Rennes 1, IETR, Rennes, France
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中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Varactors fabricated in 0.5 mu m and 0.15 mu m GaN HEMT technologies (National Research Council of Canada's GaN500 and GaN150 processes) are investigated. The devices were analyzed and characterized via DC and RF small-signal measurements up to 20 GHz. The drain and source terminals were connected, thus realizing a GaN-based heterojunction barrier varactor diode structure without changing the epitaxial masks and layers of the GaN processes. The CMAX/CMIN ratios are about 2.4 and 3.7, while the maximum cut-off frequencies are 419.2 GHz and 770.6 GHz for GaN500 and GaN150, respectively. The varactors are modeled by a simple physical equivalent circuit, and good agreement is obtained with measurements.
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页码:1268 / 1271
页数:4
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