Microwave Induced Plasma Decapsulation of Thermally Stressed Multi-tier Copper Wire Bonded IC Packages

被引：0

作者：

Tang, J. ^{[1
,2
]}

Knobben, A. R. G. W. ^{[4
]}

Reinders, E. G. J. ^{[4
]}

Revenberg, C. Th. A. ^{[4
]}

Schelen, J. B. J. ^{[3
]}

Beenakker, C. I. M. ^{[2
]}

机构：

[1] Delft Univ Technol, Mat Innovat Inst M2i, Feldmannweg 17, NL-2628 CT Delft, Netherlands

[2] Delft Univ Technol, Delft Inst Microsyst & Nanoelect, Lab Elect Components Technol Mat, NL-2628 CT Delft, Netherlands

[3] Delft Univ Technol, Delft Inst Microsyst & Nanoelect, Elect Mech Support Div, NL-2628 CT Delft, Netherlands

[4] MASER Engn B V, NL-7521 PL Enschede, Netherlands

来源：

2013 14TH INTERNATIONAL CONFERENCE ON ELECTRONIC PACKAGING TECHNOLOGY (ICEPT) | 2013年

关键词：

plasma decapsulation; copper wire; IC package; failure analysis; thermal stress testing; FAILURE ANALYSIS;

D O I：

暂无

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

Thermally stressed high-density multi-tier copper wire bonded IC packages are the most challenging tasks in IC package decapsulation. For acid decapsulation, the hardening of epoxy in molding compound after stress tests requires much longer etching duration. As a result, copper bond wires suffer severe corrosion damage compared to un-stressed package counterparts. For plasma decapsulation, the high-density bond wires block the radicals in the plasma to reach the molding compound beneath the wire loops. As a consequence, molding compound residues around the Cu/Al ball bonds become impossible to remove. This work investigates the difficulties when exposing Cu/Al ball bonds in high-density copper wire packages after thermal stress testing, and proposes an improved Microwave Induced Plasma decapsulation process that enables clean exposure of Cu/Al ball bonds while preserving the bond wire surface features.

引用

页码：981 / +

页数：3

共 12 条

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