Morphological changes in block copolymer thin films in contact with selective solvent

被引：0
|
作者：
Levicky, R
Koneripalli, N
Tirrell, M
Satija, SK
Gallagher, PD
Ankner, J
Kulasekere, R
Kaiser, H
机构：
[1] UNIV MINNESOTA,DEPT CHEM ENGN & MAT SCI,MINNEAPOLIS,MN 55455
[2] NIST,DIV REACTOR RADIAT,GAITHERSBURG,MD 20899
[3] UNIV MISSOURI,RES REACTOR CTR,COLUMBIA,MO 65211
来源：
ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY | 1996年 / 212卷
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D O I：
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中图分类号：
O6 [化学];
学科分类号：
0703 ;
摘要：
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页码：254 / PMSE
页数：1
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