Effect of TiO2 doping on rapid densification of alumina by plasma activated sintering

被引：28
|
作者：
Mishra, RS
Mukhejee, AK
Yamazaki, K
Shoda, K
机构：
[1] UNIV CALIF DAVIS,DEPT MECH & AERONAUT ENGN,DAVIS,CA 95616
[2] SODICK CO LTD,YOKOHAMA,KANAGAWA,JAPAN
来源：
JOURNAL OF MATERIALS RESEARCH | 1996年 / 11卷 / 05期
基金：
美国国家科学基金会;
关键词：
D O I：
10.1557/JMR.1996.0147
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
The effects of plasma cycle and TiO2 doping on sintering kinetics during plasma activated sintering (PAS) of gamma-Al2O3 have been studied in the temperature range of 1473-1823 K. Multiple plasma cycle leads to higher densification. Also, TiO2 doping enhances the sintering kinetics during PAS, In TiO2 doped specimens, near full density was obtained at 1673 K in less than 6 min using multiple plasma cycle. It is suggested that the dielectric properties of a material are critical for the success of the PAS process.
引用
收藏
页码：1144 / 1148
页数：5
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