Preparation of BaTiO3 thin films using pulsed KrF laser deposition and in situ laser annealing

被引：0
|
作者：
Ito, A [1 ]
Machida, A [1 ]
Obara, M [1 ]
机构：
[1] Keio Univ, Fac Sci & Technol, Dept Elect & Elect Engn, Kohoku Ku, Yokohama, Kanagawa 2238522, Japan
来源：
INTEGRATED FERROELECTRICS | 1998年 / 20卷 / 1-4期
关键词：
pulsed laser deposition; in situ laser annealing; KrF excimer laser; BaTiO3; optical thin films; thermal conductivity equation;
D O I：
10.1080/10584589808238772
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
Barium titanate (BaTiO3) thin films have been fabricated on MgO substrate using a hybrid process of pulsed KrF laser deposition (PLD) and in situ laser annealing. By utilizing in situ excimer laser annealing, epitaxial films of 1 mum thickness were successfully fabricated and its refractive index was close to that of the bulk crystal. Substrate temperature to fabricate epitaxial films was relatively low at 650 degreesC, and smooth surface films were achieved with this method.
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收藏
页码：87 / 94
页数：8
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