InGaN-GaN MQW LEDs with Si treatment

被引:26
|
作者
Hsu, YP [1 ]
Chang, SJ
Su, YK
Chen, SC
Tsai, JM
Lai, WC
Kuo, CH
Chang, CS
机构
[1] Natl Cheng Kung Univ, Inst Microelect, Tainan 70101, Taiwan
[2] Natl Cheng Kung Univ, Dept Elect Engn, Tainan 70101, Taiwan
[3] Natl Yunlin Univ Sci & Technol, Dept Elect Engn, Touliu 640, Taiwan
[4] S Epitaxy Corp, Hsin Shi 744, Taiwan
关键词
InGaN-GaN; light-emitting diode (LED); multiquantum well (MQW); Si treatment; surface roughness;
D O I
10.1109/LPT.2005.851989
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Surface morphologies of the metal-organic chemical vapor deposition-grown p-GaN layers with and without Si treatment were investigated by atomic force microscope and scanning electron microscope. It was found that Si treatment resulted in a much rougher sample surface due to the formation of a thin SixNy layer. It was also found that forward voltage of the Si-treated InGaN-GaN light-emitting diode (LED) was slightly higher than that of conventional LED without Si treatment. However, it was also found that such Si treatment could also result in a much larger LED output intensity.
引用
收藏
页码:1620 / 1622
页数:3
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