Nanohardness and crack resistance of HTS YBCO thin films

被引：9
|
作者：
Verdyan, A [1 ]
Soifer, YM
Azoulay, J
Rabkin, E
Kazakevich, M
机构：
[1] Holon Acad Inst Technol, Dept Sci, IL-58102 Holon, Israel
[2] Technion Israel Inst Technol, Dept Mat Engn, IL-32000 Haifa, Israel
来源：
IEEE TRANSACTIONS ON APPLIED SUPERCONDUCTIVITY | 2005年 / 15卷 / 02期
关键词：
cracking; high Tc superconductors; mechanical properties; nanoindentation; thin films;
D O I：
10.1109/TASC.2005.849366
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
Nanoindentation and nanoscratching using atomic force microscope (AFM) were employed to study the local mechanical properties of high TC superconductors YBCO thin films featuring high critical current density. Two YBCO films sputtered on two different substrates featuring substantial different hardness and Young's modules (sapphire and SrTiO3) were studied. The microstructure and the mechanical properties such as hardness (H), Young's modulus (E) and scratch parameters were investigated. The intrinsic hardness and Young's modulus of YBCO thin films were found to be H similar to 8.5 GPa, and E similar to 210 GPa, respectively. The substrate's influences on the mechanical parameters were found to be insignificant as long as the indentation penetration depth was below approximately 25% of the film thickness.
引用
收藏
页码：3585 / 3588
页数：4
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