InP-based all-epitaxial 1.3-μm VCSELs with selectively etched AlInAs apertures and Sb-based DBRs

被引:12
|
作者
Asano, T [1 ]
Feezell, D [1 ]
Koda, R [1 ]
Reddy, MHM [1 ]
Buell, DA [1 ]
Huntington, AS [1 ]
Hall, E [1 ]
Nakagawa, S [1 ]
Coldren, LA [1 ]
机构
[1] Univ Calif Santa Barbara, Dept Elect & Comp Engn & Mat, Santa Barbara, CA 93106 USA
关键词
optical fiber communication; quantum well lasers; semiconductor device fabrication; semiconductor lasers; surface-emitting lasers; VERTICAL-CAVITY LASERS; SURFACE-EMITTING LASERS; CONTINUOUS-WAVE OPERATION; LOW-THRESHOLD OXIDE; 1.3; MU-M; ROOM-TEMPERATURE;
D O I
10.1109/LPT.2003.817987
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
We report, for the first time, InP-based all-epitaxially grown 1.3-mum vertical-cavity surface-emitting lasers with lattice-matched Sb-based distributed Bragg reflectors and AlInAs etched apertures. The minimum threshold current and voltage under pulsed operation were 3 mA and 2.0 V, respectively. The thermal impedance was as low as 1.2 K/mW without heat sinking. implementation of the AlInAs etched aperture was quite effective in improving the injection efficiency and reducing the internal loss, resulting in improved differential efficiency.
引用
收藏
页码:1333 / 1335
页数:3
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