Si(111);
Ba;
low energy electron diffraction (LEED);
step arrangement;
reconstruction;
D O I:
10.1016/S0169-4332(00)00645-0
中图分类号:
O64 [物理化学(理论化学)、化学物理学];
学科分类号:
070304 ;
081704 ;
摘要:
Adsorbed structures of Ba on Si(1 1 1) surfaces have been observed by LEED. In elevating the annealing temperature after a few monolayers (MLs) deposition at room temperature (root3 x 2 root3)R30 degrees, 2 x 8 and 3 x 1 patterns were observed as reported by Weitering [H.H. Weltering, Surf. Sci. 355 (1996) L271]. Additionally a one-dimensional 10 x 1 pattern was observed in the temperature range between the appearance of two-dimensional 2 x 8 and 3 x 1 patterns. This pattern is considered to be produced by a combination of the periodical terrace with a width of 10 unit lengths separating each step and a 5 x 1 reconstruction on the terrace. (C) 2001 Elsevier Science B.V. All rights reserved.
机构:
Hangzhou Dianzi Univ, Coll Mech Engn, Hangzhou 310018, Peoples R China
Saitama Inst Technol, Dept High Tech Res Ctr, Fusaiji 1690, Fukaya 3690293, JapanHangzhou Dianzi Univ, Coll Mech Engn, Hangzhou 310018, Peoples R China
Li, Wenxin
Ding, Wanyu
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机构:
Dalian Jiaotong Univ, Sch Mat Sci & Engn, 794 Huanghe Rd, Dalian 116028, Peoples R ChinaHangzhou Dianzi Univ, Coll Mech Engn, Hangzhou 310018, Peoples R China
Ding, Wanyu
Gong, Youping
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机构:
Hangzhou Dianzi Univ, Coll Mech Engn, Hangzhou 310018, Peoples R ChinaHangzhou Dianzi Univ, Coll Mech Engn, Hangzhou 310018, Peoples R China
Gong, Youping
Ju, Dongying
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机构:
Saitama Inst Technol, Dept High Tech Res Ctr, Fusaiji 1690, Fukaya 3690293, Japan
Ningbo Haizhi Inst Mat Ind Innovat, Ningbo 315000, Peoples R ChinaHangzhou Dianzi Univ, Coll Mech Engn, Hangzhou 310018, Peoples R China
机构:
Elect & Telecommun Res Inst, Telecommun Basic Res Lab, Taejon 305600, South KoreaElect & Telecommun Res Inst, Telecommun Basic Res Lab, Taejon 305600, South Korea
Ha, JS
Park, KH
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Elect & Telecommun Res Inst, Telecommun Basic Res Lab, Taejon 305600, South KoreaElect & Telecommun Res Inst, Telecommun Basic Res Lab, Taejon 305600, South Korea
Park, KH
Ko, YJ
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Elect & Telecommun Res Inst, Telecommun Basic Res Lab, Taejon 305600, South KoreaElect & Telecommun Res Inst, Telecommun Basic Res Lab, Taejon 305600, South Korea
Ko, YJ
Park, KW
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Elect & Telecommun Res Inst, Telecommun Basic Res Lab, Taejon 305600, South KoreaElect & Telecommun Res Inst, Telecommun Basic Res Lab, Taejon 305600, South Korea