Experimental resolution measurement in critical dimension scanning electron microscope metrology

被引:0
|
作者
Lorusso, GF
Joy, DC [1 ]
机构
[1] Univ Tennessee, Knoxville, TN 37997 USA
[2] KLA Tencor Corp, Dept CD Metrol, San Jose, CA USA
[3] Oak Ridge Natl Lab, Oak Ridge, TN USA
关键词
critical dimension scanning electron microscope; critical dimension metrology; correlation; Fourier analysis; PERFORMANCE; SYSTEMS; SIZE;
D O I
暂无
中图分类号
TH7 [仪器、仪表];
学科分类号
0804 ; 080401 ; 081102 ;
摘要
By applying the basic principles of metrology we discuss how to define the standards that any experimental method to measure resolution has to obey. Our results clearly indicate the need to apply a calibration procedure when designing algorithms to estimate resolution to satisfy accuracy requirements. Similarly, the precision of an algorithm has to be clearly specified. We compare here the performances of a variety of commonly used implementations of published methods, with that of an algorithm based on an approach known to be reliable. Our results confirm that when an algorithm is designed with the clear intent of satisfying metrology requirements, it demonstrates excellent accuracy, precision, and lack of sensitivity to the noise level, as is desirable. As a consequence, the algorithm will have the ability to measure accurately the point spread function convoluted in the image, thus paving the way for quantitative deconvolution techniques.
引用
收藏
页码:175 / 180
页数:6
相关论文
共 50 条
  • [1] Critical dimension measurement scanning electron microscope for ULSI
    Otaka, Tadashi
    Mori, Hiroyoshi
    Yamada, Osamu
    Todokoro, Hideo
    Hitachi Review, 1995, 44 (02):
  • [2] CRITICAL DIMENSION MEASUREMENT IN THE SCANNING ELECTRON-MICROSCOPE
    POSTEK, MT
    PROCEEDINGS OF THE SOCIETY OF PHOTO-OPTICAL INSTRUMENTATION ENGINEERS, 1984, 480 : 109 - 119
  • [3] Hybrid metrology co-optimization of critical dimension scanning electron microscope and optical critical dimension
    Vaid, Alok
    Osorio, Carmen
    Tsai, Jamie
    Bozdog, Cornel
    Sendelbach, Matthew
    Grubner, Eyal
    Koret, Roy
    Wolfling, Shay
    JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS, 2014, 13 (04):
  • [4] Sidewall effect of photomask by scanning electron microscope and optical critical dimension metrology
    Yamane, T
    Hirano, T
    JOURNAL OF MICROLITHOGRAPHY MICROFABRICATION AND MICROSYSTEMS, 2005, 4 (03):
  • [5] Holistic metrology approach: hybrid metrology utilizing scatterometry, critical dimension-atomic force microscope and critical dimension-scanning electron microscope
    Vaid, Alok
    Yan, Bin Bin
    Jiang, Yun Tao
    Kelling, Mark
    Hartig, Carsten
    Allgair, John
    Ebersbach, Peter
    Sendelbach, Matthew
    Rana, Narender
    Katnani, Ahmad
    Mclellan, Erin
    Archie, Charles
    Bozdog, Cornel
    Kim, Helen
    Sendler, Michael
    Ng, Susan
    Sherman, Boris
    Brill, Boaz
    Turovets, Igor
    Urensky, Ronen
    JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS, 2011, 10 (04):
  • [6] Systematic Measurement Uncertainty of Critical Dimension Scanning Electron Microscope
    Abe, Hideaki
    Kadowaki, Motoki
    Hamaguchi, Akira
    Ikeda, Takahiro
    Yamazaki, Yuichiro
    JAPANESE JOURNAL OF APPLIED PHYSICS, 2010, 49 (06) : 06GD031 - 06GD035
  • [7] Systematic measurement uncertainty of critical dimension scanning electron microscope
    Advanced Integration Technology Group 2, Advanced Memory Integration Development Department, Advanced Memory Development Center, Yokkaichi, Mie 512-8550, Japan
    不详
    Jpn. J. Appl. Phys., 1600, 6 PART 2 (06GD031-06GD035):
  • [8] Measurement of critical dimension in scanning electron microscope mask images
    Lee, Wonsuk
    Han, Sang Hyun
    Jeong, Hong
    JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS, 2011, 10 (02):
  • [9] High-accuracy critical-dimension metrology using a scanning electron microscope
    Lowney, JR
    Vladar, AE
    Postek, MT
    METROLOGY, INSPECTION, AND PROCESS CONTROL FOR MICROLITHOGRAPHY X, 1996, 2725 : 515 - 526
  • [10] Modeling and algorithm of three-dimensional metrology with critical dimension scanning electron microscope
    Chen, Delong
    Zhou, Jielin
    Zhang, Yanjun
    Xiao, Erbo
    Ge, Jinguo
    Li, Quantong
    Liu, Zhuming
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2023, 41 (06):