The electrical and optical characteristics of TCO thin films with processing parameters

Al-doped ZnO thin films were deposited on glass substrates by RF magnetron sputtering. The sheet resistance, roughness and optical transmittances were systematically investigated with various deposition time and working pressure. As the Ar flow rate increases, the deposition rate decreased monotonically. But, the sheet resistance does not increase in proportional to the film thickness. When the film thickness was fixed to 200nm regardless of Ar flow rate, as the Ar flow rate increases, the sheet resistance was decreased.