Low-damage dry-etched grating on an MQW active layer and dislocation-free InP regrowth for 1.55-μm complex-coupled DFB lasers fabrication

被引:31
|
作者
Talneau, A [1 ]
Bouadma, N [1 ]
Lebellego, Y [1 ]
Slempkes, S [1 ]
Ougazzaden, A [1 ]
Patriarche, G [1 ]
Sermage, B [1 ]
机构
[1] France Telecom, CNET, DTD, F-92225 Bagneux, France
关键词
complex coupling; DFB lasers; gain grating; InP-based AP-MOVPE materials; RIBE etching;
D O I
10.1109/68.701505
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
A grating dry-etched through the upper wells of a multiquantum-well active layer has been characterized before and after regrowth. TEM observation and carrier lifetime measurements have shown growth-free defects of the epitaxial layers, As a consequence, quasi-100% monomode oscillation on lambda + 1 mode has been achieved on complex-coupled distributed-feedback lasers fabricated with such grating.
引用
收藏
页码:1070 / 1072
页数:3
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