Atomic force microscopy and X-ray diffraction study of surface and interface roughness in Nb/Cu multilayers

被引：1

作者：

Temst, K

VanBael, MJ

deGroot, DG

Koeman, NJ

Griessen, RP

Wuyts, B

VanHaesendonck, C

Bruynseraede, Y

机构：

[1] KATHOLIEKE UNIV LEUVEN,VASTE STOF FYS & MAGNETISME LAB,B-3001 LOUVAIN,BELGIUM

[2] VRIJE UNIV AMSTERDAM,FAC NAT KUNDE & STERRENKUNDE,1081 HV AMSTERDAM,NETHERLANDS

来源：

JOURNAL OF MAGNETISM AND MAGNETIC MATERIALS | 1996年 / 156卷 / 1-3期

关键词：

D O I：

10.1016/0304-8853(95)00806-3

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

We report on the combined use of X-ray diffraction and atomic force microscopy for the structural characterization of Nb/Cu multilayers. Analysis of the X-ray diffraction spectra yields the average interface roughness, which can be compared with the surface roughness obtained from atomic force microscopy experiments. It is found that high-angle diffraction averages over a lateral length scale which is comparable to the average grain size in the multilayers.

引用

页码：109 / 110

页数：2

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