Equilibrium configurations of epitaxially strained thin films

被引:0
|
作者
Fusco, Nicola [1 ]
机构
[1] Univ Naples Federico 2, Dipartimento Matemat & Applicaz, Naples 80126, Italy
关键词
Free boundary problems; regularity; local minimality; second variation; CRYSTALLINE FILMS; FREE-BOUNDARY; REGULARITY;
D O I
10.4171/RLM/576
中图分类号
O29 [应用数学];
学科分类号
070104 ;
摘要
We present some regularity results on equilibrium configurations for a variational model introduced to describe the epitaxial growth of an elastic film over a thick flat substrate when a lattice mismatch between the two materials is present. We also give a sufficient condition for local minimality based on second variation and apply it to determine analitycally the critical threshold for the local minimality of the flat configuration.
引用
收藏
页码:341 / 348
页数:8
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