Influence of single-source precursors on PACVD-derived boron carbonitride thin films

被引：30
|
作者：
Hegemann, D
Riedel, R
Oehr, C
机构：
[1] Tech Univ Darmstadt, Fachbereich Mat Wissensch, Fachgebiet Disperse Feststoffe, D-64287 Darmstadt, Germany
[2] Fraunhofer Inst Grenzflachen & Bioverfahrenstech, D-70563 Stuttgart, Germany
来源：
THIN SOLID FILMS | 1999年 / 339卷 / 1-2期
关键词：
boron carbonitride; pyridine-borane; triazaborabicyclodecane; r.f; plasma; self-bias;
D O I：
10.1016/S0040-6090(98)01327-3
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
This work investigates the influence of the B/C/N containing single-source precursors pyridine-borane (PB) and triazaborabicyclodecane (TBBD) on the chemical composition of boron carbonitride thin films. The films are deposited via a PACVD process, activated by 13.56 MHz radio frequency (r.f.). N-2, AT and He serve as carrier gases. The chemical compositions of the coatings are analyzed by anger electron spectroscopy and the fragmentation of TBBD by mass spectrometry. It becomes evident, that from a certain bias voltage, the self-bias in capacitively r.f, electrical discharges mainly influences the chemical composition of the BCN films independent of the used precursor. (C) 1999 Elsevier Science S.A. All rights reserved.
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页码：154 / 159
页数：6
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