Adhesion properties of electroless-plated Cu layers on polyimide treated by inductively coupled Plasmas

被引:19
|
作者
Kim, J. H. [1 ,2 ]
Seol, Y. G. [1 ,2 ]
Lee, N. -E. [1 ,2 ]
机构
[1] Sungkyunkwan Univ, Sch Adv Mat Sci & Engn, Suwon 400746, South Korea
[2] Sungkyunkwan Univ, Ctr Adv Plasma Surface Technol, Suwon 400746, South Korea
关键词
polyimide; plasma treatment; adhesion; electroless plating; copper;
D O I
10.3938/jkps.51.187
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
This study investigated the improvements gained in the adhesion properties of electroless-plated Cu on a polyimide (PI) substrate by plasma surface treatments of PI using O-2 and N-2/H-2 inductively coupled plasma (ICP). The O-2 plasma treatment mainly induced physical changes which increased the surface roughness, whereas the N-2/H-2 plasma caused chemical changes to the PI surface via the creation of amine groups, thereby inducing effective adsorption of the Pd catalyst. The measured adhesion strength of the electroless-plated Cu to the PI surface was correlated with the plasma-induced, PI surface roughening. The present study results confirm the effectiveness of ICP surface treatments by O-2 followed by N-2/H-2 in increasing the adhesion strength of the electroless-plated Cu on the PI substrate.
引用
收藏
页码:S187 / S192
页数:6
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