Significant mobility enhancement in extremely thin highly doped ZnO films

被引:15
|
作者
Look, David C. [1 ,2 ,3 ]
Heller, Eric R. [4 ]
Yao, Yu-Feng [5 ]
Yang, C. C. [5 ]
机构
[1] Wright State Univ, Semicond Res Ctr, Dayton, OH 45435 USA
[2] Wyle Labs Inc, Dayton, OH 45431 USA
[3] Air Force Res Lab Sensors Directorate, Wright Patterson AFB, OH 45433 USA
[4] Air Force Res Lab Mat & Mfg Directorate, Wright Patterson AFB, OH 45433 USA
[5] Natl Taiwan Univ, Inst Photon & Optoelect, Taipei 10617, Taiwan
基金
美国国家科学基金会;
关键词
Compendex;
D O I
10.1063/1.4917561
中图分类号
O59 [应用物理学];
学科分类号
摘要
Highly Ga-doped ZnO (GZO) films of thicknesses d = 5, 25, 50, and 300 nm, grown on 160-nm ZnO buffer layers by molecular beam epitaxy, had 294-K Hall-effect mobilities mu(H) of 64.1, 43.4, 37.0, and 34.2 cm(2)/V-s, respectively. This extremely unusual ordering of mu(H) vs d is explained by the existence of a very high-mobility Debye tail in the ZnO, arising from the large Fermi-level mismatch between the GZO and the ZnO. Scattering theory in conjunction with Poisson analysis predicts a Debye-tail mobility of 206 cm(2)/V-s at the interface (z = d), falling to 58 cm(2)/V-s at z = d+2nm. Excellent fits to mu(H) vs d and sheet concentration n(s) vs d are obtained with no adjustable parameters. (c) 2015 AIP Publishing LLC.
引用
收藏
页数:4
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