Photosensitive compounds with chloromethyl groups

被引：0

作者：

Rusu, E ^{[1
]}

Barboiu, V ^{[1
]}

Airinei, A ^{[1
]}

Comanita, E ^{[1
]}

Rusu, G ^{[1
]}

机构：

[1] P Poni Inst Macromol Chem, Iasi 6600, Romania

来源：

REVUE ROUMAINE DE CHIMIE | 2000年 / 45卷 / 05期

关键词：

D O I：

暂无

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

The synthesis and the photochemical behavior of some chloromethyl derivatives with photosensitive beta -phenyl acryloyl (cinnamoyl) or phenylene diacryloyl groups are presented, The compounds are characterized by H-1-NMR and UV-Vis spectroscopy as well as by elemental analysis.

引用

页码：451 / 456

页数：6

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