Influence of the Surface Roughness of a Silicon Disk Resonator on Its Q-Factor

被引:2
|
作者
Yakuhina, Anastasia, V [1 ]
Kadochkin, Alexey S. [1 ]
Gorelov, Dmitry, V [1 ]
Svetukhin, Vyacheslav V. [1 ]
Generalov, Sergey S. [1 ]
Amelichev, Vladimir V. [1 ]
机构
[1] Fed State Budgetary Sci Inst, Technol Ctr, Sci Mfg Complex, Off 7237 House 1 Bld 7,Shokina Sq, Moscow 124489, Russia
关键词
integrated optics; silicon technology; whispering gallery modes; photonics; ultrahigh-frequency resonator; Q-factor; roughness; OPTICAL FEEDBACK; DFB-LASER;
D O I
10.3390/photonics8060225
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
This article presents a silicon disk resonator of the whispering-gallery-mode (WGM) type. The calculated Q-factor of the silicon WGM resonator was 10(7). Two methods of studying the surface roughness of a silicon WGM resonator with a nonlinear profile by means of Helios 650 scanning electron microscope and Bruker atomic force microscope (AFM) are presented. The results obtained by the two methods agreed well with each other. A comparison of the surface roughness values of WGM resonators manufactured using different technological approaches is presented. Based on the obtained data, a preliminary estimated Q-factor calculation of the resonators was performed, which was refined by numerical calculation using the finite-difference time-domain (FDTD) method. The effect of the surface roughness of the resonator on its Q-factor was found. Reducing the surface roughness of the resonator from 30 nm to 1-2 nm led to an increase in its Q-factor from 10(4) to 10(7).
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页数:12
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