Geometrical frustration and the competing phases of the Sn/Si(111) √3 x √3R30° surface systems

被引:23
|
作者
Li, Gang [1 ]
Laubach, Manuel [1 ]
Fleszar, Andrzej [1 ]
Hanke, Werner [1 ]
机构
[1] Univ Wurzburg, Inst Theoret Phys & Astrophys, D-97074 Wurzburg, Germany
来源
PHYSICAL REVIEW B | 2011年 / 83卷 / 04期
关键词
D O I
10.1103/PhysRevB.83.041104
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
We investigate the electronic correlation effects on the Sn/Si(111) root 3 x root 3R30 degrees surface by combining the ab initio density-functional approach with the dynamical mean-field theory, the variational cluster approach, and the dual fermion (DF) method. A metal-insulator transition with first or second order at finite or zero temperature is predicted at a critical on-site Hubbard U(c) similar to 0.65 eV and the system is proven to be short-range correlated. The electron-electron interaction favors a row-wise antiferromagnetic (RW-AFM) order, although the noninteracting system does not have a pronounced nesting at the Fermi surface. The stabilization of the RW-AFM order over the 120 degrees AF one for certain interaction strengths is shown to be due to the longer-range single-particle hopping terms.
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页数:4
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