Substrate temperature effect on the optical and electrical properties of antimony trisulfide thin films

被引:60
|
作者
El Zawawi, IK [1 ]
Abdel-Moez, A
Terra, FS
Mounir, M
机构
[1] Natl Res Ctr, Dept Phys, Cairo, Egypt
[2] Cairo Univ, Fac Sci, Dept Phys, Cairo, Egypt
关键词
substrate temperature; antimony trisulfide thin films; thermal vacuum evaporation;
D O I
10.1016/S0040-6090(98)00350-2
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Thin films of antimony trisulfide Sb2S3 were prepared by thermal vacuum evaporation technique at substrate temperatures from 300-498 K. At substrate temperature T-s less than or equal to 473 K, the films have amorphous structure, while those prepared at T-s = 498 K have polycrystalline structure as identified by X-ray diffraction analysis. The optical investigation of films showed a shift in the optical absorption coefficient (alpha) spectra at the high-energy region. The optical gap increases (1.62 to 1.78 eV) by decreasing the substrate temperature of the deposited films as T-s decreases from 473-300 K. The electrical properties are affected by substrate temperature. The dark electrical resistivity of the films decreases by one order of magnitude as T-s increases from 300 to 498 K. The activation energy decreases with increasing the substrate temperature. (C) 1998 Published by Elsevier Science S.A. All rights reserved.
引用
收藏
页码:300 / 304
页数:5
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