A practical view of stability analysis in discrete event dynamic systems: A case study on plasma etching system

被引：0

作者：

Cho, KH ^{[1
]}

Lim, JT ^{[1
]}

机构：

[1] Korea Adv Inst Sci & Technol, Dept Elect Engn, Taejon 305701, South Korea

来源：

1998 IEEE INTERNATIONAL CONFERENCE ON SYSTEMS, MAN, AND CYBERNETICS, VOLS 1-5 | 1998年

关键词：

D O I：

暂无

中图分类号：

TP3 [计算技术、计算机技术];

学科分类号：

0812 ;

摘要：

There has been much interest in studying the stability properties of discrete event dynamic systems (DEDSs), and several definitions for stability with some kinds of stability analysis methods have been proposed, recently. However, they are too much theory-oriented and do not provide any sufficient understanding based on real applications. Therefore, in this paper, we explore the meaning of stability concepts in DEDSs through the case study of a manufacturing system, the plasma etching system in semiconductor manufacturing processes. We apply the concepts of stability and stabilizability upon a general characterization of the stability properties of automata-theoretic DEDS models. The stability notion is expounded by considering the control-law synthesis of the plasma etching system in view of stabilizability.

引用

页码：627 / 631

页数：5

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