Atomic-scale electron beam processing

被引：4
|
作者：
Kizuka, T
Yanaka, T
机构：
[1] Nagoya Univ, Sch Engn, Dept Appl Phys, Chikusa Ku, Nagoya, Aichi 4648603, Japan
[2] Nagoya Univ, Res Ctr Adv Waster & Emiss Management, Chikusa Ku, Nagoya, Aichi 4648603, Japan
[3] Japan Sci & Technol Corp, Precursory Res Embryon Sci & Technol, Chikusa Ku, Nagoya, Aichi 4648603, Japan
[4] TOPCON Corp, Electron Beam Div, Itabashi Ku, Tokyo 174, Japan
来源：
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1999年 / 38卷 / 3A期
关键词：
electron beam processing; high-resolution transmission electron microscopy; atomic fabrication; magnesium oxide; in situ microscopy;
D O I：
10.1143/JJAP.38.1595
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
Atomic-scale electron beam processing was demonstrated using high-resolution transmission electron microscopy. Nanometer-size holes were produced through magnesium oxide films. The minimum hole size was 0.84 nm and the minimum distance between the holes was 0.63 nm.
引用
收藏
页码：1595 / 1595
页数：1
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