High productivity object-oriented defect detection algorithms for the new modular die-to-database reticle inspection platform

被引：1
|
作者：
Avakaw, S
机构：
来源：
EMLC 2005: 21ST EUROPEAN MASK AND LITHOGRAPHY CONFERENCE | 2005年 / 5835卷
关键词：
D O I：
10.1117/12.637300
中图分类号：
TH7 [仪器、仪表];
学科分类号：
0804 ; 080401 ; 081102 ;
摘要：
The paper presents a description of one of the main elements of a new modular automatic reticle defect inspection platform - a defect detection sub-system. This platform is currently under active development at Planar Concern. This paper presents the results of the use of the object-oriented approach which was used in the development of the defect detection algorithms for the die-to-database reticle inspection system. Furthermore, the paper presents briefly the architecture and technology of the new modular automatic reticle inspection platform.
引用
收藏
页码：290 / 299
页数：10
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