Electron moire method and its application to micro-deformation measurement

被引:21
|
作者
Kishimoto, S [1 ]
Xie, HM [1 ]
Shinya, N [1 ]
机构
[1] Natl Res Inst Met, Tsukuba, Ibaraki 3050047, Japan
关键词
electron moire; model grid; electron beam lithography; photolithography; micro-deformation; creep; electronic packaging; grain boundary;
D O I
10.1016/S0143-8166(00)00078-6
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
In this paper, the single and two deposited metal layers method were proposed to produce the model grating for electron moire method. The measurement principle of electron moire method and the techniques for manufacturing model grid are expounded in detail. The accuracy of measuring strain using this method is discussed. The gratings with single deposited layer and two deposited layers with high frequency up to 5000 lines/mm were produced on different substrates. From the experimental results, both single deposited metal layer and two deposited metal layers gratings showed their heat resistance ability. Using the gratings produced and a replicated model grid, the electron moire method was applied to measure the deformation of the strain around holes in a polyimide resin substrate, thermal strain of electronic packaging component and tensile creep around grain boundary in a pure copper specimen. (C) 2000 Elsevier Science Ltd. All rights reserved.
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页码:1 / 14
页数:14
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