Recent developments in chemical vapour deposition

被引：0
|
作者：
Kempster, A [1 ]
机构：
[1] Diffusion Alloys Ltd, Hatfield, Herts, England
来源：
TRANSACTIONS OF THE INSTITUTE OF METAL FINISHING | 1998年 / 76卷
关键词：
D O I：
暂无
中图分类号：
O646 [电化学、电解、磁化学];
学科分类号：
081704 ;
摘要：
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页码：B88 / B93
页数：6
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