Multi-kilohertz, ultrafast hard X-ray Kα source

被引：9
|
作者：
Witte, H. [1 ,2 ]
Silies, M. [1 ,2 ]
Haarlammert, T. [1 ]
Hueve, J. [1 ]
Kutzner, J. [1 ,2 ]
Zacharias, H. [1 ,2 ]
机构：
[1] Univ Munster, Inst Phys, D-48149 Munster, Germany
[2] Ctr Nanotechnol CeNTech, D-48149 Munster, Germany
来源：
APPLIED PHYSICS B-LASERS AND OPTICS | 2008年 / 90卷 / 01期
关键词：
D O I：
10.1007/s00340-007-2868-3
中图分类号：
O43 [光学];
学科分类号：
070207 ; 0803 ;
摘要：
We report on the performance of a femtosecond laser-based hard X-ray K-alpha source operating up to 10 kHz repetition rate. Using chromium- or iron-containing tapes, spectrally narrow band K-alpha 1 and K-alpha 2 radiation at about 5.4 and 6.4 keV is generated. Employing up to 1 mJ pulse energy in the fundamental more than 10(9) K-alpha photons s(-1) are generated in 4 pi steradian.
引用
收藏
页码：11 / 14
页数：4
相关论文
共 50 条
  • [1] Multi-kilohertz, ultrafast hard X-ray Kα source
    H. Witte
    M. Silies
    T. Haarlammert
    J. Hüve
    J. Kutzner
    H. Zacharias
    [J]. Applied Physics B, 2008, 90 : 11 - 14
  • [2] A Highly Stable-Output Kilohertz Femtosecond Hard X-ray Pulse Source for Ultrafast X-ray Diffraction
    Zhao, Di
    You, Pengxian
    Yang, Jing
    Yu, Junhong
    Zhang, Hang
    Liao, Min
    Hu, Jianbo
    [J]. APPLIED SCIENCES-BASEL, 2022, 12 (09):
  • [3] All optical ultrafast synchrotron hard X-ray source
    Albert, F.
    Shah, R.
    Phuoc, K. Ta
    Pukhov, A.
    Kiselev, S.
    Rousseau, J.
    Burgy, F.
    Mercier, B.
    Rousse, A.
    [J]. SUPERSTRONG FIELDS IN PLASMAS, 2006, 827 : 480 - +
  • [4] Multi-kilohertz electro-optic switch for ultrafast laser systems
    [J]. Rimington, N.W., 2000, IEEE, Piscataway, NJ, United States
  • [5] A multi-kilohertz pinch plasma radiation source for extreme ultraviolet lithography
    Bergmann, K
    Rosier, O
    Lebert, R
    Neff, W
    Poprawe, R
    [J]. MICROELECTRONIC ENGINEERING, 2001, 57-8 : 71 - 77
  • [6] Compact cryogenically cooled Ti:Sapphire dual multi-kilohertz amplifiers for synchrotron radiation ultra-fast x-ray applications
    Feng, J.
    Nasiatka, J.
    Hertlein, M.
    Rude, B.
    Padmore, H.
    [J]. REVIEW OF SCIENTIFIC INSTRUMENTS, 2013, 84 (05):
  • [7] Femtosecond hard X-ray plasma sources with a kilohertz repetition rate
    F. Zamponi
    Z. Ansari
    C. v. Korff Schmising
    P. Rothhardt
    N. Zhavoronkov
    M. Woerner
    T. Elsaesser
    M. Bargheer
    T. Trobitzsch-Ryll
    M. Haschke
    [J]. Applied Physics A, 2009, 96 : 51 - 58
  • [8] Femtosecond hard X-ray plasma sources with a kilohertz repetition rate
    Zamponi, F.
    Ansari, Z.
    Schmising, C. Von Korff
    Rothhardt, P.
    Zhavoronkov, N.
    Woerner, M.
    Elsaesser, T.
    Bargheer, M.
    Trobitzsch-Ryll, T.
    Haschke, M.
    [J]. APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 2009, 96 (01): : 51 - 58
  • [9] Characteristics of ultrafast K line hard x-ray source from femtosecond terawatt laser-produced plasma
    Chen, M
    Chen, JW
    Gao, HY
    Lu, PX
    Xu, ZZ
    [J]. CHINESE PHYSICS, 2003, 12 (01): : 55 - 59
  • [10] Thin scintillators for ultrafast hard X-ray imaging
    Wang, Zhehui
    Barnes, Cris W.
    Kapustinsky, Jon S.
    Morris, Chris L.
    Nelson, Ron O.
    Yang, Fan
    Zhang, Liyuan
    Zhu, Ren-Yuan
    [J]. PHOTON COUNTING APPLICATIONS 2015, 2015, 9504
12345