Monte Carlo simulation of transport properties in wide gap Hg3Se2I2

被引:1
|
作者
Min, Lujin [1 ,2 ]
Liu, Zhifu [1 ]
Peters, J. A. [1 ,3 ]
He, Yihui [4 ]
Kanatzidis, Mercouri G. [4 ]
Zhu, Jingchuan [2 ]
Wessels, Bruce W. [1 ]
机构
[1] Northwestern Univ, Dept Mat Sci & Engn, Evanston, IL 60208 USA
[2] Harbin Inst Technol, Sch Mat Sci & Engn, Harbin 150001, Heilongjiang, Peoples R China
[3] Chicago State Univ, Dept Chem & Phys, Chicago, IL 60628 USA
[4] Northwestern Univ, Dept Chem, 2145 Sheridan Rd, Evanston, IL 60208 USA
基金
美国国家科学基金会;
关键词
Hg-based semiconductors; wide gap semiconductor; photoconductivity; gamma-ray detector; CRYSTAL-GROWTH; RADIATION; SEMICONDUCTORS;
D O I
10.1088/1361-6641/ab3fdd
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Hg3Se2I2 is a promising chalcohalide semiconductor for x- and gamma-ray room-temperature semiconductors detectors. In addition to having a high density and wide bandgap of 2.15 eV, it also possesses a relatively high electron mobility. Using Ensemble Monte Carlo simulation, we explored its transport properties and underlying factors responsible for its carrier mobility. The parameters used in the Monte Carlo simulations were obtained from experimental measurements and density functional theory calculations. The simulations indicate that the semiconductor has a high electron mobility of the order of 172 +/- 0.16 cm(2) V-1 s(-1) at room temperature. Electron mobility in Hg3Se2I2 was insensitive to impurity concentration for values less than 10(15) cm(-3).
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页数:6
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