Focused ion beam microfabrication of single-crystal nanobridge toward Fe(Te,Se)-based Josephson device

被引:0
|
作者
Miyazawa, Takamaro [1 ]
Tadokoro, Naoki [1 ]
Horikawa, Shumpei [1 ]
Tamegai, Tsuyoshi [2 ]
Sun, Yue [1 ]
Kitano, Haruhisa [1 ]
机构
[1] Aoyama Gakuin Univ, Dept Phys, Chuo Ku, 5-10-1 Fuchinobe, Sagamihara, Kanagawa 2585258, Japan
[2] Univ Tokyo, Dept Appl Phys, Bunkyo Ku, 7-3-1 Hongo, Tokyo 1138656, Japan
关键词
PHASE-DIAGRAM; SUPERCONDUCTIVITY; FESE;
D O I
10.1088/1742-6596/1975/1/012010
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
We report the fabrication and the transport measurements of FeTe1-xSex (x=0.4, 1) nanobridges along the c axis, toward the appearance of Josephson effects in single-crystal devices. Cross sectional areas of both FeTe0.6Se0.4 and FeSe nanobridges were systematically reduced to 0.06 mu m(2) by using a new method based on the focused ion beam (FIB) techniques. The critical current I-c measured by the current-voltage characteristics is roughly two orders of magnitude smaller than that for the conventional microbridges with larger cross sections, while the IcRn product, where R-n is the normal-state resistance along the c axis, is still 3-4 times larger than the theoretical value for the appearance of Josephson effects. We argue the importance of the development of single-crystal Josephson devices and the comparison between FeTe0.6Se0.4 and FeSe nanobridges.
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页数:7
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