Maskless photoencoded selective etching for glass-based microtechnology applications

被引：7
|
作者：
Kyung, JH [1 ]
Lawandy, NM [1 ]
机构：
[1] BROWN UNIV,DIV ENGN,PROVIDENCE,RI 02912
来源：
OPTICS LETTERS | 1996年 / 21卷 / 03期
关键词：
D O I：
10.1364/OL.21.000174
中图分类号：
O43 [光学];
学科分类号：
070207 ; 0803 ;
摘要：
Two-photon excitation of carriers in boron E'-center-containing borosilicate glasses results in a photoencoding of selectively etchable regions. Using a turbulent etching process followed by polishing, we have demonstrated a number of patterning capabilities for microtechnology applications such as ultrafast capillary electrophoresis chips and rapid prototyping of diffractive optical elements. (C) 1996 Optical Society of America
引用
收藏
页码：174 / 176
页数：3
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