Fabrication of an infrared antenna-coupled microbolometer linear array using chrome as a mask

The fabrication process for a dipole a dipole antenna-coupled microbolometer linear array was presented. A process which uses a reactive ion etcher (RIE) with chromium as a mask for the fabrication of the aluminum dipole antennas was demonstrated. It was shown that a traditional lift-off process yielded aluminum dipole antenna arms with widths of 200 nm. The results show that the method of fabrication allowed for a single layer of resist to be used, enhanced linewidth control to 90 nm for the dipole antenna arms.