Effect of Ultra-High Pulse Frequency on the resolution in the Electrochemical Deposition of Nickel

被引:0
|
作者
Kamaraj, Abishek [1 ]
Reed, Natalie [2 ]
Sundaram, Murali [2 ]
机构
[1] Kettering Univ, Dept Ind & Mfg Engn, 1700 Univ Ave, Flint, MI 48504 USA
[2] Univ Cincinnati, Dept Mech & Mat Engn, 2600 Clifton Ave, Cincinnati, OH 45219 USA
基金
美国国家科学基金会;
关键词
Electroforming; Modeling; Resolution; ELECTRODEPOSITION; FABRICATION;
D O I
10.1016/j.promfg.2021.06.010
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Using localized electrochemical deposition (LECD) as a mask-less direct writing methodology, metal shapes are printed. The electrochemical double-layer capacitance at ultra-high frequencies is hypothesized to cause a localized deposition and the effect of pulse frequency on the current density is modeled to predict the deposition resolution and rate of deposition. Experimental results confirm that the deposition resolution and efficiency of the LECD process increase with the increase of pulse frequency. Deposition resolution 80% smaller than the tool diameter is feasible in the LECD of nickel used with a empty set 250 mu m tool at 1 MHz pulsed power. (C) 2021 The Authors. Published by Elsevier B. V.
引用
收藏
页码:59 / 63
页数:5
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