Optical Studies of Nanocrystalline and Amorphous TiO2 Thin Films Deposited by HiTUS Technique

被引:0
|
作者
Studenyak, Ihor [1 ]
Nahusko, Olexander [1 ]
Izai, Vitalii [1 ]
Kranjcec, Mladen [2 ]
Kus, Peter [3 ]
Mikula, Marian [3 ]
Mussabekov, Kanat [4 ]
Kociubinski, Andrzej [5 ]
机构
[1] Uzhgorod Natl Univ, Uzhgorod, Ukraine
[2] Univ North, Varazhdin, Croatia
[3] Comenius Univ, Bratislava, Slovakia
[4] Kazakh Acad Transport & Commun, Alma Ata, Kazakhstan
[5] Lublin Univ Technol, Lublin, Poland
关键词
thin film; optical absorption; refractive index; Urbach behaviour; structural disorder; GAS-SENSING PROPERTIES; ABSORPTION EDGE; COATINGS; GAAS;
D O I
10.1117/12.2501508
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
TiO2 thin films were deposited on glass substrates by HiTUS (high target utilization sputtering) technique. Structural studies of TiO2 thin films of different thickness were performed by X-ray diffraction. Refractive index and extinction coefficient were measured by spectroscopic ellipsometer. Transmission spectra of TiO2 thin films were investigated in the temperature interval 77-300 K. The temperature behaviour of Urbach absorption edge for TiO2 thin film was studied. The effect of temperature on the optical parameters and order-disorder processes in TiO2 thin films was analysed.
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页数:7
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