Optical attachment for transformation of output beam of excimer laser

被引：0
|
作者：
Zhevlakov, Alexander [1 ]
Gavrilov, Egor [1 ]
Kascheev, Sergey [1 ]
Kujanpaa, Veli [2 ]
Savinainen, Timo [3 ]
机构：
[1] SI Vavilov State Opt Inst, Inst Laser Phys, St Petersburg, Russia
[2] Lappeenranta Univ Technol, Lappeenranta, Finland
[3] VTT Ind Syst, Lappeenranta, Finland
来源：
LASER OPTICS 2010 | 2010年 / 7822卷
关键词：
excimer laser; ultraviolet radiation; hot point; microprocessing;
D O I：
10.1117/12.885210
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
The optical attachment for transformation the spatial characteristics of excimer laser has been experimentally investigated. The laser beam of rectangular section with sizes of 3 x 20 mm and divergence of 2 x 5 mrad after passage of an optical attachment got the square form 20 x 20 mm and equal divergence of 5 x 5 mrad orthogonal directions. It is shown, that application of such unit in the facilities for microprocessing of materials simplifies an optical path of illumination module, allows to receive the optimum uniformity of irradiation (within 2 %) at reproductive image with micron accuracy in plane of processed material and to mitigate the beam load on optical elements due to suppression of influence of "hot" points.
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页数：6
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