Strain Response of Monolayer MoS2 in The Ballistic Regime

被引：0
|
作者：
Chang, Hung-Chih [1 ,2 ]
Chen, Pin-Shiang [3 ]
Yang, Fu-Liang [4 ]
Liu, C. W. [1 ,2 ,3 ]
机构：
[1] Natl Taiwan Univ, Dept Elect Engn, Taipei 10764, Taiwan
[2] Natl Taiwan Univ, Grad Inst Elect Engn, Taipei 10764, Taiwan
[3] Natl Taiwan Univ, Grad Inst Photon & Optoelect, Taipei 10764, Taiwan
[4] Acad Sinica, Res Ctr Appl Sci, Taipei 115, Taiwan
来源：
PROCEEDINGS OF TECHNICAL PROGRAM - 2014 INTERNATIONAL SYMPOSIUM ON VLSI TECHNOLOGY, SYSTEMS AND APPLICATION (VLSI-TSA) | 2014年
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中图分类号：
TP [自动化技术、计算机技术];
学科分类号：
0812 ;
摘要：
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页数：2
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