Conditions leading to the formation of polymer thin layers with densely dispersed organic dyes using the "vapor transportation method" with vacuum technique

被引:12
|
作者
Mizokuro, T [1 ]
Mochizuki, H [1 ]
Yamamoto, N [1 ]
Tanaka, N [1 ]
Horiuchi, S [1 ]
Tanigaki, N [1 ]
Hiraga, T [1 ]
机构
[1] AIST, Ikeda, Osaka 5638577, Japan
来源
关键词
polymer thin layer; photochromic dye; vapor transportation; vacuum technique; memory medium;
D O I
10.1117/12.473168
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
The "vapor transportation method" with vacuum technique, developed previously in our laboratory, was used to form polymer thin layers with densely dispersed photochromic dyes on polystyrene (PS), poly(methyl methacrylate) (PMMA), and polycarbonate (PC) substrates. The organic photochromic dye cis-1,2-dicyano-1,2-bis(2,4,5-trimethyl-3-thienyl)ethane (CMTE) was used, and the rate of formation of the CMTE-containing layer was as follows: PS > PC > PMMA. These observations are important for application of the present method to the formation of organic memory media for optical recording etc. These results also indicate that the formation rate is dependent on not only the chemical composition and the structure of the polymer substrate, but also on the treatment temperature. Optical density (OD) measurements of the CMTE-dispersed thin polymer films showed maximum values near the glass transition temperature (TB) with increases in temperature of film formation. The T-g values of CMTE-dispersed polymers decreased rapidly after CMTE-dispersal into the polymer matrices; indicating that T-g values of the polymers are important parameters for investigation of the mechanism of formation of CMTE-dispersed layers on polymer substrates using the present method.
引用
收藏
页码:333 / 340
页数:8
相关论文
共 8 条
  • [1] A novel formation method of thin polymer film with densely dispersed organic dye by using vacuum technique
    Hiraga, T
    Chen, GR
    Tsujita, K
    Tanaka, N
    Chen, QY
    Moriya, T
    [J]. MOLECULAR CRYSTALS AND LIQUID CRYSTALS, 2000, 344 : 211 - +
  • [2] A new formation method of a polymer thin film with organic dyes using vacuum technique
    Mizokuro, T
    Mochizuki, H
    Yamamoto, N
    Tanaka, N
    Horiuchi, S
    Hiraga, T
    [J]. JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY, 2002, 15 (01) : 137 - 140
  • [3] A formation of organic rewritable optical memory media using the vapor transportation method
    Mizokuro, T
    Mochizuki, H
    Yamamoto, N
    Horiuchi, S
    Tanigaki, N
    Hiraga, T
    Tanaka, N
    [J]. JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY, 2003, 16 (02) : 195 - 198
  • [4] Effects of Reaction Conditions on MoS2 Thin Film Formation Synthesized by Chemical Vapor Deposition using Organic Precursor
    S. Ishihara
    Y. Hibino
    N. Sawamoto
    T. Ohashi
    K. Matsuura
    H. Machida
    M. Ishikawa
    H. Sudo
    H. Wakabayashi
    A. Ogura
    [J]. MRS Advances, 2017, 2 (29) : 1533 - 1538
  • [5] Low temperature formation of ultra-thin SiO2 layers using direct oxidation method in a catalytic chemical vapor deposition system
    Izumi, A
    Sohara, S
    Kudo, M
    Matsumura, H
    [J]. ULTRATHIN SIO2 AND HIGH-K MATERIALS FOR ULSI GATE DIELECTRICS, 1999, 567 : 115 - 120
  • [6] Vapor Coating Method Using Small-Molecule Organic Surface Modifiers to Replace N-Type Metal Oxide Layers in Inverted Polymer Solar Cells
    Choi, Hyosung
    Kim, Hak-Beom
    Ko, Seo-Jin
    Kim, Gi-Hwan
    Kim, Jin Young
    [J]. ACS APPLIED MATERIALS & INTERFACES, 2014, 6 (09) : 6504 - 6509
  • [7] Effect of deposition conditions and buffer layers on amorphous or polytype phase formation in Al2O3 thin films by chemical vapor deposition using tri-methyl aluminum
    Lin, Chunfu
    Tanaka, Takashi
    Nishiyama, Akio
    Shiota, Tadashi
    Sakurai, Osamu
    Wakiya, Naoki
    Shinozaki, Kazuo
    Yasuda, Kouichi
    [J]. JOURNAL OF THE CERAMIC SOCIETY OF JAPAN, 2019, 127 (06) : 443 - 450
  • [8] The interface formation and adhesion of metals (Cu, Ta, and Ti) and low dielectric constant polymer-like organic thin films deposited by plasma-enhanced chemical vapor deposition using para-xylene precursor
    Kim, KS
    Jang, YC
    Kim, HJ
    Quan, YC
    Choi, J
    Jung, D
    Lee, NE
    [J]. THIN SOLID FILMS, 2000, 377 : 122 - 128