Microplasmas: scientific challenges & technological opportunities

被引：31
|
作者：
Becker, K. H. [1 ]
Kersten, H. [2 ]
Hopwood, J. [3 ]
Lopez, J. L. [4 ,5 ]
机构：
[1] NYU, Dept Phys, Polytech Inst, Brooklyn, NY 11201 USA
[2] Univ Kiel, Inst Expt & Appl Phys, D-24098 Kiel, Germany
[3] Tufts Univ, Dept Elect & Comp Engn, Medford, MA 02155 USA
[4] St Peters Coll, Dept Appl Sci & Technol, Jersey City, NJ 07306 USA
[5] St Peters Coll, Ctr Microplasma Sci & Technol, Jersey City, NJ 07306 USA
来源：
EUROPEAN PHYSICAL JOURNAL D | 2010年 / 60卷 / 03期
关键词：
DIELECTRIC BARRIER DISCHARGE; PRESSURE; OPERATION; SILICON; ARRAYS;
D O I：
10.1140/epjd/e2010-00231-4
中图分类号：
O43 [光学];
学科分类号：
070207 ; 0803 ;
摘要：
[No abstract available]
引用
收藏
页码：437 / 439
页数：3
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