Synthesis of ZnO films with a special texture and enhanced field emission properties

被引:6
|
作者
Wang Xiao-Ping [1 ]
Wang Zi [2 ]
Wang Li-Jun [1 ]
Mei Cui-Yu [1 ]
机构
[1] Univ Shanghai Sci & Technol, Coll Sci, Shanghai 200093, Peoples R China
[2] Tongji Univ, Sch Transportat Engn, Shanghai 200092, Peoples R China
关键词
nano-ZnO thin films; hydrogen plasma treatment; field electron emission; microwave plasma chemical vapour deposition;
D O I
10.1088/1674-1056/20/10/105203
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
ZnO films with special textures are fabricated on Mo-coated Al(2)O(3) ceramic substrates by the catalyst-free electron beam evaporation method, and the as-deposited films are treated by hydrogen plasma. It is found that the surface morphologies of the films are changed significantly after hydrogen plasma treatment and that the films consist of vertically standing and intersecting nanosheets. A lower turn-on field of 1.2 V/mu m and an enhanced current density similar to 0.11 mA/cm(2) at 2.47 V/mu m are achieved. The low threshold field and the high emission current density are attributed primarily to the unique shape and smaller resistivity of the ZnO nanosheet films.
引用
收藏
页数:4
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