Photon antibunching from a single lithographically defined InGaAs/GaAs quantum dot

被引:15
|
作者
Verma, V. B. [1 ]
Stevens, Martin J. [1 ]
Silverman, K. L. [1 ]
Dias, N. L. [2 ]
Garg, A. [2 ]
Coleman, J. J. [2 ]
Mirin, R. P. [1 ]
机构
[1] Natl Inst Stand & Technol, Div Optoelect, Boulder, CO 80305 USA
[2] Univ Illinois, Dept Elect & Comp Engn, Urbana, IL 61801 USA
来源
OPTICS EXPRESS | 2011年 / 19卷 / 05期
基金
美国国家科学基金会;
关键词
CRYPTOGRAPHY; TEMPERATURE; TURNSTILE;
D O I
10.1364/OE.19.004182
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
We demonstrate photon antibunching from a single lithographically defined quantum dot fabricated by electron beam lithography, wet chemical etching, and overgrowth of the barrier layers by metalorganic chemical vapor deposition. Measurement of the second-order autocorrelation function indicates g((2))(0) = 0.395 +/- 0.030, below the 0.5 limit necessary for classification as a single photon source. (C) 2011 Optical Society of America
引用
收藏
页码:4182 / 4187
页数:6
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