Deep states in silicon δ-doped GaAs

被引:3
|
作者
Aleshkin, VY [1 ]
Danil'tsev, VM [1 ]
Murel', AV [1 ]
Khrykin, OI [1 ]
Shashkin, VI [1 ]
机构
[1] Russian Acad Sci, Inst Phys Microstruct, Nizhnii Novgorod 603600, Russia
关键词
D O I
10.1134/1.1187460
中图分类号
O469 [凝聚态物理学];
学科分类号
070205 ;
摘要
The density and electron trapping cross section of deep states in silicon delta-doped GaAs were investigated by means of measurements of the voltage and temperature dependences of the impedance of a Schottky contact to the structure. It was observed that density-of-states tails appear in the band gap when the silicon density in the delta-layer exceeds 6 x 10(12) cm(-2). In our structures the energy characterizing the penetration depth of a tail was in the range 20-100 meV. The characteristic electron trapping cross section of deep states in delta-layers was of the order of 10(-17) cm(2). It was shown that saturation of the electron density in the delta-layer with increasing Si density is due to self-compensation of Si. (C) 1998 American Institute if Physics.
引用
收藏
页码:659 / 664
页数:6
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