Analysis of Self-Heating Effects in Multi-Nanosheet FET Considering Bottom Isolation and Package Options

被引:28
|
作者
Yoo, Changhyun [1 ]
Chang, Jeesoo [2 ]
Seon, Yoongeun [3 ]
Kim, Hyunwoo [1 ]
Jeon, Jongwook [1 ]
机构
[1] Konkuk Univ, Dept Elect & Elect Engn, Seoul 05029, South Korea
[2] Samsung Elect, Data & Informat Technol DIT Ctr, Hwasung Si 18448, Gyeonggi Do, South Korea
[3] Samsung Elect, Design Enablement Team, Hwasung Si 18448, Gyeonggi Do, South Korea
关键词
Bottom oxide (BO); multi-nanosheet FET (mNS-FET); self-heating effect (SHE); thermal resistance (R-th); THERMAL-CONDUCTIVITY; RELIABILITY; PERFORMANCE; FINFET; IMPACT;
D O I
10.1109/TED.2022.3141327
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Self-heating effects (SHEs) of multi-nanosheet FET (mNS-FET) at the 3-nm technology node were analyzed at the device and circuit level considering the introduction of punchthrough-stopper (PTS) doping and bottom oxide (BO), which are substrate processes to reduce leakage current. Changes in the heat path according to the back-end-of-line (BEOL) configuration and package type were also considered. After optimizing the PTS doping and BO process through six case analyses using three-dimensional (3-D) TCAD simulations, SHE characteristics were investigated. As a result, the channel temperature risen due to SHE was larger when BO was applied than when BO was not applied, and that the face-down package was more effective in heat dissipation than the face-up package. Next, the SHE behavior during dynamic operation of logic and analog circuits was analyzed through SPICE modeling, and the effect of this on circuit performance and reliability was analyzed. As a result, in the logic ring oscillator circuit, the SHE shows a slight AC performance degradation of similar to 1.3%, but in terms of reliability, it causes a decrease in the lifetime of 15.1%-22.1%. In the two types of analog circuits, the possibility of circuit malfunction can be confirmed by SHE, and in terms of reliability, it causes a reduction in lifetime of 53.5%-89.9%. Therefore, it is expected that device and circuit design that can reduce SHE are required in consideration of the various processes analyzed in this work.
引用
收藏
页码:1524 / 1531
页数:8
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