Cr/SmCo/Cu/Cr thin films with high coercivity deposited at low pressure

被引:7
|
作者
Qiu, Zhaoguo [1 ,2 ,3 ]
Poudyal, Narayan [2 ]
Yu, Hongya [1 ,3 ]
Han, Guangbing [2 ]
Zeng, Dechang [1 ]
Liu, J. Ping [2 ]
Zhou, Kesong [1 ]
机构
[1] South China Univ Technol, Sch Mat Sci & Engn, Guangzhou 510640, Guangdong, Peoples R China
[2] Univ Texas Arlington, Dept Phys, Arlington, TX 76019 USA
[3] SouthChinaUniv Technol, Gent Mat Surface Technol Guangdong Co Ltd, Zhongshan R&D Ctr Mat Surface & Thin Films Techno, Zhongshan 528437, Peoples R China
关键词
SmCo thin film; High coercivity; Low deposition pressure; Annealing temperature; MAGNETIC-PROPERTIES; ALLOY;
D O I
10.1016/j.jallcom.2016.05.242
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
The Cr/SmCo/Cu/Cr multi-layer thin films with high coercivity were prepared under low deposition pressure by using the magnetron sputtering. The as-deposited SmCo films show the amorphous structure while Sm2Co17 or SmCo5 hard magnetic phases appear upon annealing in vacuum furnace at temperature between 500 and 600 degrees C. It is also found that the SmCo phase transformation takes place from SmCo5 to Sm2Co17 with elevating deposition pressure from 2 to 5 m Torr. The post-annealing temperature has a great effect on the phase transition and the decomposition of the SmCo phase. It is found that the magnetic properties of the films including coercivity are dependent both on the deposition pressure and the annealing temperature. In-plane coercivity value of as high as 38 kOe was obtained for the SmCo film deposited at 2 m Torr pressure when annealed at 550 degrees C, while the coercivity drops down to 15 kOe when the annealing temperature of 600 degrees C was used because of the decomposition of SmCo phase. The results suggest that single phase SmCo thin films with high coercivity can be effectively produced by simply adjusting the synthesis parameters in magnetron sputtering system. (C) 2016 Elsevier B.V. All rights reserved.
引用
收藏
页码:459 / 464
页数:6
相关论文
共 50 条
  • [1] Preparation, microstructure and magnetic properties of high-coercivity SmCo/Cr films
    Yan, Ge
    Liu, Xianghua
    Cui, Liya
    Zhou, Shaoxiong
    Zheng, Wu
    Wang, Ailing
    Chen, Jinchang
    Gongneng Cailiao/Journal of Functional Materials, 1999, 30 (03): : 254 - 255
  • [2] High-coercivity SmCo5 thin films deposited on glass substrates
    Zhang, L.N.
    Chen, J.S.
    Ding, J.
    Hu, J.F.
    Journal of Applied Physics, 2008, 103 (11):
  • [3] High-coercivity SmCo5 thin films deposited on glass substrates
    Zhang, L. N.
    Chen, J. S.
    Ding, J.
    Hu, J. F.
    JOURNAL OF APPLIED PHYSICS, 2008, 103 (11)
  • [4] High-coercivity SmCo5 thin films deposited on MgO and glass substrates
    Zhang, L. N.
    Ding, J.
    Hu, J. F.
    Chen, J. S.
    2008 2ND IEEE INTERNATIONAL NANOELECTRONICS CONFERENCE, VOLS 1-3, 2008, : 1038 - +
  • [5] Influencing mechanisms of atomic diffusion and compositional distribution on the magnetic anisotropy of Cr/SmCo/(Cu)/Cr thin films
    Hong, Y.
    Qiu, Z. G.
    Zheng, Z. G.
    Wang, G.
    Yu, H. Y.
    Chen, D. Y.
    Han, G. B.
    Zeng, D. C.
    Liu, J. P.
    ACTA MATERIALIA, 2019, 164 : 627 - 635
  • [6] Magnetic properties of SmCo/Cr thin films with Cr under different preparation conditions
    Liu, XH
    Cui, LY
    Zhou, SX
    Wang, CY
    Quan, BY
    Wang, LJ
    Zheng, W
    Wang, AL
    Chen, JC
    MATERIALS SCIENCE AND ENGINEERING A-STRUCTURAL MATERIALS PROPERTIES MICROSTRUCTURE AND PROCESSING, 2001, 304 (1-2): : 1043 - 1045
  • [8] Synthesis of Cu/Cr Multilayer Thin Films Deposited by Unbalanced Magnetron Sputtering
    Burinskas, Saulius
    Dudonis, Julius
    MATERIALS SCIENCE-MEDZIAGOTYRA, 2009, 15 (03): : 220 - 223
  • [9] Materials' properties of low temperature deposited Cu/W and Cu/Cr multilayer thin films using high power impulse magnetron sputtering
    Huang, Yu
    Nguyen, Tra Anh Khoa
    Dang, Nhat Minh
    Wang, Hao-Yu
    Lin, Ming-Tzer
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 2024, 42 (03):
  • [10] HIGH COERCIVITY OF COCRTA ON A VERY THIN CR UNDERLAYER
    LIN, JC
    WU, CD
    SIVERTSEN, JM
    IEEE TRANSACTIONS ON MAGNETICS, 1990, 26 (01) : 39 - 41