FABRICATION OF SEMICONDUCTOR PHOTOCATALYST AND ITS HIGH PHOTOCATALYTIC PERFORMANCE UNDER VISIBLE LIGHT IRRADIATION

Recent years, photocatalytic technology is a compassionate of eco-friendly methods that has displayed significant consideration in the environmental fields. In this work, a series of high-performance Ag2W04/W03/RGO photocatalysts (AWR) were synthesized through a facile hydrothermal approach, The products were characterized by using X-ray diffraction (XRD), scanning electron microscopy (SEM), Raman spectra, UV-vis diffuse reflectance spectroscopy (DRS), photoluminescence (PL) spectra, X-ray photoelectron spectroscopy (XPS) and Brunauer-Emmett-Teller (BET) nitrogen adsorption apparatus. The results indicated that the as -prepared Ag2W04/W03 particles were distributed on the surface of RGO sheets and the introduction of RGO could narrow the band gap of Ag2W04/W03. By using decontaminations of methyleneblue (MB) model reactions, the photocatalytic efficiencies of AWR photocatalysts were evaluated, The AWR photocatalysts exhibited superior photocatalytic activity under visible light irradiation, The photocatalytic activities of all AWR photocatalysts were higher than those of the W03, Ag,W04 and Ag2W04/W03 and about 98,15% MB was removed in 180 min. The possible mechanism of photocatalytic activity enhancement was proposed, The current work shows a design and synthesis of stable and high efficiency photocatalysts, applicable for the removal of the environmental organic pollutants,