In-situ observation of the three-dimensional nano-structure growth on focused-lon-beam chemical vapor deposition by scanning electron microscope

被引：12

作者：

Kometani, Reo ^{[1
,2
]}

Ishihara, Sunao ^{[1
]}

Kaito, Takashi ^{[4
]}

Matsui, Shinji ^{[2
,3
]}

机构：

[1] Univ Tokyo, Grad Sch Engn, Bunkyo Ku, Tokyo 1138656, Japan

[2] Japan Sci & Technol Agcy, CREST, Kawaguchi, Saitama 3320012, Japan

[3] Univ Hyogo, Grad Sch Sci, Ako, Hyogo 6781205, Japan

[4] SII NanoTechnol Inc, Shizuoka 4101393, Japan

来源：

APPLIED PHYSICS EXPRESS | 2008年 / 1卷 / 05期

关键词：

D O I：

10.1143/APEX.1.055001

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

To fabricate arbitrary three-dimensional (3-D) nanostructures, it is necessary to first understand the growth mechanism that occurs during focused-ion-beam chemical vapor deposition (FIB-CVD). With the aim of elucidating these details, we carried out in-situ observation of 3-D nanostructure growth during FIB-CVID using a scanning electron microscope (SEM) in a FIB/SEM dual-beam system. As a result, we demonstrated experimentally that the 3-D nanostructure growth depended on the beam profile of the FIB as well as the FIB irradiation time and scanning speed. (c) 2008 The Japan Society of Applied Physics.

引用

页码：0550011 / 0550013

页数：3

共 43 条

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