In-situ Synchrotron X-ray Diffraction measurement of Epitaxial FeRh Thin Films

被引：0

作者：

Jang, Sung-Uk ^{[1
]}

Hyun, Seungmin ^{[2
]}

Lee, Hwan Soo ^{[3
]}

Kwon, Soon-Ju ^{[1
]}

Kim, Ji-Hong ^{[1
]}

Park, Ki-Hoon ^{[1
]}

Lee, Hak-Joo ^{[2
]}

机构：

[1] Pohang Univ Sci & Technol, Dept Mat Sci & Engn, Lab Photosynth Mat & Devices, Pohang, South Korea

[2] KIMM, Div Nano Mech Syst Res, Daejeon, South Korea

[3] Samsung Electro Mech Co Ltd, eMD Ctr, Suwon, South Korea

来源：

INEC: 2010 3RD INTERNATIONAL NANOELECTRONICS CONFERENCE, VOLS 1 AND 2 | 2010年

关键词：

MAGNETIC RECORDING MEDIA; EXCHANGE SPRING FILMS;

D O I：

暂无

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

The magnetic properties and structure of Fe Rh thin film epitaxially grown onto MgO(001) substrate were studied by MPMS(Magnetic Properties Measure System) and in-situ temperature synchrotron XRD(X-ray Diffraction). The transition temperature of Fe Rh thin films was around 380K. Both M-T curve and d-spacing changes correspond to each other very closely. Abrupt changes in the lattice constants can be observed from the in-situ analysis. Also, there is the likelihood of existence of a new phase.

引用

页码：742 / +

页数：2

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