The study of the oxidation of thin Ti films by neutron reflectometry

被引：14
|
作者：
Matveev, V. A. [1 ]
Pleshanov, N. K. [1 ]
Bulkin, A. P. [1 ]
Syromyatnikov, V. G. [1 ]
机构：
[1] Petersburg Nucl Phys Inst, St Petersburg 188300, Russia
来源：
5TH EUROPEAN CONFERENCE ON NEUTRON SCATTERING | 2012年 / 340卷
关键词：
THERMAL-NEUTRONS; SUPERMIRRORS; INTERDIFFUSION; REFLECTION; COATINGS;
D O I：
10.1088/1742-6596/340/1/012086
中图分类号：
O469 [凝聚态物理学];
学科分类号：
070205 ;
摘要：
Neutron reflectometry is found to be quite sensitive to oxidation of very thin layers of Ti. Preliminary results of the study of oxidation of thin Ti films in air are represented. The thickness of the oxide layers formed in air at room temperature on Ti films of thickness 20, 10 and 5 nm (as sputtered) is found to be 2.9 +/- 0.3, 3.6 +/- 0.3 and 6.1 +/- 0.3 nm, respectively. The annealing at temperatures in the range 100-300 degrees C leads to the growth in the oxide layer thickness and in roughness of both (air/oxide and oxide/metal) interfaces. The study of the oxidation of thin Ti films is of interest for improvement of polarizing neutron mirrors and supermirrors.
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页数：4
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