Ultraviolet emission from OH and ArD in microcavity plasma devices

被引：3

作者：

Ricconi, B. J. ^{[1
]}

Park, S. J. ^{[1
]}

Sung, S. H. ^{[1
]}

Tchertchian, P. A. ^{[1
]}

Eden, J. G. ^{[1
]}

机构：

[1] Univ Illinois, Dept Elect & Comp Engn, Lab Opt Phys & Engn, Urbana, IL 61801 USA

来源：

ELECTRONICS LETTERS | 2007年 / 43卷 / 22期

关键词：

D O I：

10.1049/el:20071673

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

Intense emission in the ultraviolet (250-400 nm) from OH (A(2)Sigma(+)) and the rare gas-deuteride excimer ArD has been observed from mixtures of H2O vapour or D-2 in At and excited in microcavity plasma devices. Peak wavelength-integrated intensities are measured for H2O and D-2 concentrations of similar to 0.16% and 0.5-1%, respectively. Spectral simulations indicate the OH (A(2)Sigma(+), v'=0) rotational temperature to be 440 +/- 20 K for 600 Torr Ar/0.3 Torr H2O mixtures excited in a 45 nL microcavity.

引用

页码：1194 / 1196

页数：3

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