Poly(dimethylsiloxane) (PDMS) surface patterning by biocompatible photo-crosslinking block copolymers

Poly(2-methacryloyloxyethyl phosphorylcholine) (PMPC) possesses protein antifouling properties. Diblock copolymers (PMPC120-b-P(TSM/CEAx)(y)) composed of a PMPC block and random copolymer block with 3-(tris(trimethylsiloxy)silyl)propyl methacrylate (TSM) and 2-cinnamoylethyl acrylate (CEA) were prepared via reversible addition-fragmentation chain transfer (RAFT) radical polymerization. A thin film of PMPC120-P(TSM/CEAx)(y) formed on the surface of the poly(dimethylsiloxane) (PDMS) substrate due to physical adsorption of the TSM units to poly(dimethylsiloxane) (PDMS) and photo-crosslinking of the CEA units. A lattice pattern of PMPC120-P(TSM/CEAx)(y) on the PDMS surface was prepared using UV irradiation through a photomask. PMPC120-P(TSM/CEAx)(y)-coated PDMS demonstrated protein antifouling activity. Cell patterning could be achieved by culturing on the PMPC-patterned PDMS substrate.