Crystallization of amorphous CoFeB ferromagnetic layers in CoFeB/MgO/CoFeB magnetic tunnel junctions

被引:40
|
作者
Takeuchi, Takashi
Tsunekawa, Koji
Choi, Young-Suk
Nagamine, Yoshinori
Djayaprawira, David D.
Genseki, Akira
Hoshi, Yoichi
Kitamoto, Yoshitaka
机构
[1] Tokyo Inst Technol, Dept Innovat & Engineered Mat, Interdisciplinary Grad Sch Sci & Engn, Midori Ku, Yokohama, Kanagawa 2268502, Japan
[2] Canon ANELVA Corp, Proc Technol Dept, Electron Device Equipment Div, Fuchu, Tokyo 1838508, Japan
[3] Tokyo Inst Technol, Ctr Adv Mat Anal, Meguro Ku, Tokyo 1528550, Japan
[4] Tokyo Polytech Univ, Dept Syst Elect & Informat Technol, Atsugi, Kanagawa 2430297, Japan
关键词
magnetic tunnel junction; tunneling magnetoresistance effect; CoFeB; epitaxy; MgO tunnel barrier; coherent tunneling;
D O I
10.1143/JJAP.46.L623
中图分类号
O59 [应用物理学];
学科分类号
摘要
We demonstrate that the crystallization of ferromagnetic CoFeB layers originates at the interface with a MgO layer in CoFeB/ MgO/CoFeB magnetic tunnel junctions by annealing using cross-sectional transmission electron microscopy and electron diffraction. The CoFeB layers, which are amorphous in the as-deposited state, crystallize with a (001) out-of-plane texture by annealing at 360 degrees C. Crystal grains of 15-20 nm in the CoFeB layers are observed at the interface with the MgO layer, but not at the interface with a Ta or Ru layer. Much smaller crystal grains with random crystal orientations are formed in a region away from the MgO interface in the CoFeB layers. The depth profiles obtained by X-ray photoelectron spectroscopy show that boron diffuses from the crystallized region at the interface into the MgO layer and the rest of the region in the CoFeB layers during crystallization, indicating that crystal grains have much lower B contents than the original composition.
引用
收藏
页码:L623 / L626
页数:4
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